The 3rd DSA Symposium will be organise in the University of Chicago, September 17-19, 2017.
Directed Self-Assembly (DSA) is rapidly advancing as a potential patterning solution for Advanced Lithography. Nevertheless, several outstanding issues need to be resolved before the technique can find its way into mainstream application. In an effort to identify and help resolve these remaining issues, a 3rd International Symposium on DSA will be organized as a collaborative effort between U. Chicago, NIST, CEA-Leti and imec, as a follow-up to the second edition at CEA-Leti in 2016. DSA2017 will be held at the University of Chicago in Chicago, IL (USA) on Sep 17-19, 2017. The format will be similar as DSA2015 and 2016 with an opening reception, poster session and 2 full days of talks.
Abstracts due :June 1st 2017
Authors notification : August 1st, 2017