Directed Self-Assembly (DSA) is rapidly advancing as a potential patterning solution for Advanced Lithography. Nevertheless, several outstanding issues need to be resolved before the technique can find its way into mainstream application. In an effort to identify and help resolve these remaining issues, a 2nd International Symposium on DSA will be organized as a collaborative effort between CEA-Leti, imec, EIDEC and NIST, as a follow-up to the successful first edition at imec in 2015. DSA2016 will be held at the at CEA-Leti in Grenoble (France) on Oct 11-13, 2016. The format will be similar as DSA2015 with an opening reception, poster session and 2 full days of talks.
Opening for registration: May 1st, 2016
Abstracts due : Juin 1st, 2016
Authors notification : August 15th, 2016